PREPARATION OF AGGAS2 FILMS BY EXCIMER-LASER DEPOSITION

被引:3
作者
UCHIKI, H
MACHIDA, O
TANAKA, A
HIRASAWA, H
机构
[1] Department of Electrical Engineering, Nagaoka University of Technology, Nagaoka, 940-21
[2] Department of Electrical Engineering, Oyama National College of Technology, Oyama, 323
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1993年 / 32卷 / 6A期
关键词
AGGAS2; THIN FILM; LASER DEPOSITION; XECL EXCIMER LASER; X-RAY DIFFRACTION; RAMAN SPECTRUM; TRANSMISSION SPECTRUM; PHOTOLUMINESCENCE SPECTRUM;
D O I
10.1143/JJAP.32.L764
中图分类号
O59 [应用物理学];
学科分类号
摘要
AgGaS2 thin films have been prepared on quartz substrates by means of XeCl excimer laser deposition from a mixture target of Ag2S and Ga2S3. Measurements of X-ray diffraction, Raman scattering, transmission and photoluminescence spectra show that the deposited films were chalcopyrite-type, polycrystalline AgGaS2 compound highly oriented in the [112] direction.
引用
收藏
页码:L764 / L766
页数:3
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