SPUTTERING YIELD INCREASE WITH TARGET TEMPERATURE FOR AG

被引:24
作者
BEHRISCH, R
ECKSTEIN, W
机构
[1] Max-Planck Institut für Plasmaphysik, EURATOM Association, München
关键词
D O I
10.1016/0168-583X(93)96027-A
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Collision cascade sputtering may be influenced by the target temperature due to a modification of the collision cascade as well as by changes of the surface binding energy or heat of sublimation. Calculations with the computer simulation program TRIM.SP have shown that already a small decrease of the surface binding energy has a strong nonlinear effect on the sputtering yield, especially at energies near the threshold energy for sputtering. For silver the heat of sublimation near the melting point is about 2.7% lower than at room temperature. However, an increase of the sputtering yield of about 36% for 60 eV deuterium ion bombardment at normal incidence was found. Due to the large sublimation rate of Ag at temperatures above about 850 K sputtering yields measured at these temperatures show large uncertainties, and it will be difficult to experimentally confirm the increase of the collisional sputtering yield with temperature.
引用
收藏
页码:255 / 258
页数:4
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