MEASUREMENT OF CH3 AND CH DENSITIES IN A DIAMOND GROWTH DC DISCHARGE

被引：11

作者：

CHILDS, MA ^{[1
]}

MENNINGEN, KL ^{[1
]}

TOYODA, H ^{[1
]}

ANDERSON, LW ^{[1
]}

LAWLER, JE ^{[1
]}

机构：

[1] NAGOYA UNIV,DEPT ELECT ENGN,CHIKUSA KU,NAGOYA 46401,JAPAN

来源：

EUROPHYSICS LETTERS | 1994年 / 25卷 / 09期

关键词：

D O I：

10.1209/0295-5075/25/9/016

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A highly sensitive multielement optical-absorption method is used to measure the absolute column densities of both CH3 and CH in a d.c. plasma-assisted diamond chemical-vapor-deposition (CVD) system with an input gas of CH4 diluted in H2. The CH3 column density decreases slowly with distance from the cathode and increases with increasing CH4 input fraction. The CH density is sharply peaked near the cathode. The CH3 and CH densities are compared with measurements of the same radicals made in a hot-filament diamond CVD system.

引用

页码：729 / 734

页数：6

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