ONLINE GAS-PHASE OPTICAL DIAGNOSTICS IN PLASMA CVD DEPOSITION OF CARBON-FILMS

被引：11

作者：

FANTONI, R ^{[1
]}

GIORGI, M ^{[1
]}

MOLITERNI, AGG ^{[1
]}

BERDEN, WCM ^{[1
]}

LAZIC, V ^{[1
]}

MARTINI, O ^{[1
]}

MATTIOT, FP ^{[1
]}

机构：

[1] ENIRICERCHE SPA,I-00015 MONTEROTONDO,ITALY

来源：

JOURNAL OF MATERIALS RESEARCH | 1992年 / 7卷 / 05期

关键词：

D O I：

10.1557/JMR.1992.1204

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Space resolved, on-line spontaneous and stimulated emission, and CARS diagnostics have been employed on CH4/H2 mixtures excited by rf-discharge in order to investigate the chemical processes and the gas phase kinetics in the plasma. CH4 and H2 concentration and temperature have been monitored during the process as a function of main reaction parameters (rf-power, total pressure, CH4/H2 ratio). Formation of CH,H2, and H in excited states has been observed. On the basis of present spectroscopic data, a model for the gas-phase reactions accompanying the carbon film deposition is proposed.

引用

页码：1204 / 1214

页数：11

共 31 条

[1] RESONANCE-ENHANCED COHERENT ANTI-STOKES RAMAN-SCATTERING IN C2 [J].