CHARACTERIZATION OF BIAS-ENHANCED NUCLEATION OF DIAMOND ON SILICON BY INVACUO SURFACE-ANALYSIS AND TRANSMISSION ELECTRON-MICROSCOPY

被引:472
作者
STONER, BR
MA, GHM
WOLTER, SD
GLASS, JT
机构
[1] Department of Materials Science and Engineering, North Carolina State University, Raleigh
来源
PHYSICAL REVIEW B | 1992年 / 45卷 / 19期
关键词
D O I
10.1103/PhysRevB.45.11067
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An in-depth study has been performed of the nucleation of diamond on silicon by bias-enhanced microwave plasma chemical vapor deposition. Substrates were pretreated by negative biasing in a 2% methane-hydrogen plasma. The bias pretreatment enhanced the nucleation density on unscratched silicon wafers up to 10(11) cm-2 as compared with 10(7) cm-2 on scratched wafers. In vacuo surface analysis including x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy, and combined XPS and electron-energy-loss spectroscopy were used to study systematically both the initial-nucleation and growth processes. High-resolution cross-sectional transmission electron microscopy (TEM) was used to study the physical and structural characteristics of the diamond-silicon interface as well as to complement and enhance the in vacuo surface-analytical results. Raman spectroscopy confirmed that diamond was actually nucleating during the bias pretreatment. Scanning electron microscopy has shown that once the bias is turned off, and conventional growth is conducted, diamond grows on the existing nuclei and no continued nucleation occurs. If the bias is left on throughout the entire deposition, the resulting film will be of much poorer quality than if the bias had been turned off and conventional growth allowed to begin. Intermittent surface analysis showed that a complete silicon carbide layer developed before diamond could be detected. High-resolution cross-sectional TEM confirmed that the interfacial layer was amorphous and varied in thickness from 10 to 100 angstrom. A small amount of amorphous carbon is detected on the surface of the silicon carbide and it is believed to play a major role in the nucleation sequence. A model is proposed to help explain bias-enhanced nucleation on silicon, in hopes that this will improve the understanding of diamond nucleation, in general, and eventually result in the nucleation and growth of better-quality diamond films.
引用
收藏
页码:11067 / 11084
页数:18
相关论文
共 68 条
[1]  
ANGUS JA, UNPUB
[2]   GROWTH OF DIAMOND SEED CRYSTALS BY VAPOR DEPOSITION [J].
ANGUS, JC ;
WILL, HA ;
STANKO, WS .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (06) :2915-&
[3]  
ANGUS JC, IN PRESS P INT S DIA
[4]  
BACHMANN PK, UNPUB
[5]  
BACHMANN PK, 1988, DIAMOND DIAMOND LIKE, P99
[6]   NUCLEATION AND GROWTH PHENOMENA IN CHEMICALLY VAPOR-DEPOSITED DIAMOND COATINGS [J].
BADZIAN, AR ;
BADZIAN, T .
SURFACE & COATINGS TECHNOLOGY, 1988, 36 (1-2) :283-293
[7]   ELECTRON SPECTROSCOPIC IDENTIFICATION OF CARBON SPECIES FORMED DURING DIAMOND GROWTH [J].
BELTON, DN ;
SCHMIEG, SJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03) :2353-2362
[8]   INSITU CHARACTERIZATION OF DIAMOND NUCLEATION AND GROWTH [J].
BELTON, DN ;
HARRIS, SJ ;
SCHMIEG, SJ ;
WEINER, AM ;
PERRY, TA .
APPLIED PHYSICS LETTERS, 1989, 54 (05) :416-418
[9]   LOSS OF EPITAXY DURING DIAMOND FILM GROWTH ON ORDERED NI(100) [J].
BELTON, DN ;
SCHMIEG, SJ .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (09) :4223-4229
[10]  
BELTON DN, IN PRESS J APPL PHYS