CORRELATION BETWEEN THE ISOELECTRIC POINT OF SOLID-SURFACES OF METAL-OXIDES AND X-RAY PHOTOELECTRON-SPECTROSCOPY CHEMICAL-SHIFTS

被引：40

作者：

DELAMAR, M

机构：

[1] Institut de Topologie et de Dynamique des Systèmes, Associé au CNRS, Université Paris 7, 75005 Paris

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1990年 / 53卷 / 03期

关键词：

D O I：

10.1016/0368-2048(90)80335-8

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

The isoelectric point of solid surfaces (IEPS) is an important parameter characterizing the acid-base and adhesion behaviour of oxide surfaces. A satisfactory correlation is obtained between the sum of the metal and oxygen X-ray photoelectron spectroscopy chemical shifts and the IEPS for some anhydrous oxide surfaces. This shows that the overall acid-base behaviour of the surface results from the competition between the acidity of the cation and the basicity of oxygen. © 1990.

引用

页码：C11 / C14

页数：4

共 14 条

[1]

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[2]

CHEHIMI MM, 1990, ADHESION 90 PAPERS

[3]

HUHEEY J, 1978, INORG CHEM, P264

[4]

JOHNSON O, 1975, CHEM SCRIPTA, V8, P162