BETA-CHROMIUM PLATING FROM A CHROMIC-ACID ELECTROLYTE CONTAINING FORMIC-ACID

被引:15
作者
TSAI, RY
WU, ST
机构
[1] Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu
关键词
D O I
10.1149/1.2086522
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
β-chromium has been deposited from a cold (20°C) chromic acid electrolyte containing formic acid. The film remains stable for more than two months. The lattice type is found to be that of ZnS of wurtzite type with lattice constants of a = 0.2724 nm and c = 0.4422 nm. The chemical composition is CrH0.53C0.04O0.013. The film exhibits strong texture; its microstructure is very different from that of conventional hard chromium. The film starts to decompose at about 120°C to become a-chromium in a nitrogen atmosphere and, concurrently, the microhardness drops from Hv 880 to Hv 600. © 1990, The Electrochemical Society, Inc. All rights reserved.
引用
收藏
页码:638 / 644
页数:7
相关论文
共 14 条
[1]  
DUBPERNELL G, 1977, ELECTRODEPOSITION CH, P16
[2]   A CHARACTERIZATION STUDY OF AMORPHOUS CHROMIUM FILMS ELECTRODEPOSITED FROM CHROMIC-ACID SOLUTIONS .2. [J].
HOFLUND, GB ;
GROGAN, AL ;
ASBURY, DA ;
LAITINEN, HA ;
HOSHINO, S .
APPLIED SURFACE SCIENCE, 1987, 28 (03) :224-234
[3]   THE ELECTRODEPOSITION AND PROPERTIES OF AMORPHOUS CHROMIUM FILMS PREPARED FROM CHROMIC-ACID SOLUTIONS [J].
HOSHINO, S ;
LAITINEN, HA ;
HOFLUND, GB .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (04) :681-685
[4]  
KASAAIAN AM, 1984, PLAT SURF FINISH, V71, P66
[5]  
REEDHILL RE, 1973, PHYSICAL METALLURGY, P207
[6]  
SAFRANEK WH, 1986, PROPERTIES ELECTRODE, pCH5
[8]   STUDIES ON THE STRUCTURE OF HARD CHROMIUM PLATE [J].
SNAVELY, CA ;
FAUST, CL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1950, 97 (03) :99-108
[9]  
Snavely CA, 1949, J AM CHEM SOC, V71, P313
[10]  
THOMAS G, 1979, TRANSMISSION ELECTRO, P28