INFLUENCE OF THE PLASMA PARAMETERS ON THE PROPERTIES OF A-SI FILMS PREPARED BY GLOW-DISCHARGE DEPOSITION METHOD

被引：19

作者：

KOCIAN, P

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1980年 / 35-6卷 / JAN-期

关键词：

D O I：

10.1016/0022-3093(80)90593-1

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：195 / 200

页数：6

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PHYSICAL REVIEW B, 1979, 19 (04) :2064-2073

[9] OPTICAL AND PHOTOCONDUCTIVE PROPERTIES OF DISCHARGE-PRODUCED AMORPHOUS SILICON [J].

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