DEPOSITION OF AMORPHOUS SILICON FILMS FROM GLOW-DISCHARGE PLASMAS OF SILANE

被引:56
作者
BRODSKY, MH [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1016/0040-6090(77)90095-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
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页码:L23 / L25
页数:3
相关论文
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