INVERSE PHOTOEMISSION-STUDY OF NICKEL SILICIDES

被引:13
作者
AZIZAN, M
BAPTIST, R
CHAUVET, G
TAN, TAN
机构
[1] CEN,LETI,IRDI,CEA,F-38041 GRENOBLE,FRANCE
[2] CEN,CEA,DRF,SERV PHYS PSC,F-38041 GRENOBLE,FRANCE
关键词
D O I
10.1016/0038-1098(86)90658-7
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:1 / 3
页数:3
相关论文
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