KRYPTON ION AND PULSED LASER-INDUCED REACTIONS IN THE FE-SI SYSTEM

被引：3

作者：

GUPTA, A

GUPTA, R

PRINCIPI, G

JANNITTI, E

TOSELLO, C

GRATTON, LM

LORUSSO, S

RIGATO, V

FRATTINI, R

机构：

[1] UNIV PADUA,DIPARTIMENTO INGN MECCAN,SEZ MAT,I-35100 PADUA,ITALY

[2] CNR,IST GAS IONIZZATI,I-35100 PADUA,ITALY

[3] UNIV TRENTO,DIPARTIMENTO FIS,TRENT,ITALY

[4] UNIV PADUA,DIPARTIMENTO FIS,I-35100 PADUA,ITALY

[5] UNIV VENICE,DIPARTIMENTO CHIM FIS,VENICE,ITALY

来源：

SURFACE & COATINGS TECHNOLOGY | 1992年 / 51卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(92)90280-N

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Alloy phase formation in equiatomic Fe-Si multilayers using two different non-equilibrium processes, laser quenching and ion-beam mixing, was studied using different analytical techniques. It was found that the two kinds of sample treatment produce rather similar mixed structures, with concentration gradients depending on the sample thickness. The results are discussed in terms of the mechanisms responsible for amorphization induced by different sample treatments.

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页码：451 / 454

页数：4

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