ION-BEAM-INDUCED REACTIONS IN IRON-SILICON SYSTEM

被引：6

作者：

HAYASHI, N ^{[1
]}

SAKAMOTO, I ^{[1
]}

TANOUE, A ^{[1
]}

KURIYAMA, K ^{[1
]}

机构：

[1] HOSEI UNIV,TOKYO 184,JAPAN

来源：

HYPERFINE INTERACTIONS | 1986年 / 29卷 / 1-4期

关键词：

D O I：

10.1007/BF02399445

中图分类号：

O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];

学科分类号：

070203 ; 070304 ; 081704 ; 1406 ;

摘要：

引用

页码：1183 / 1186

页数：4

共 8 条

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[2] PHASE-TRANSFORMATION IN HELIUM ION IRRADIATED 316 STAINLESS-STEEL [J].

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[3]

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[4]

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[5] ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES [J].

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HUNG, LS .

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[6] ION-BEAM MIXING AT FE-SI INTERFACE - AN INTERFACE-SENSITIVE CONVERSION ELECTRON MOSSBAUER SPECTROSCOPIC STUDY [J].

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BHIDE, VG .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (08) :2915-2920

[7] CONVERSION ELECTRON MOSSBAUER STUDY OF AMORPHOUS FESI THIN-FILMS [J].

OSWALD, RS ;

RON, M ;

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SOLID STATE COMMUNICATIONS, 1978, 26 (12) :883-887

[8] MAGNETIC-PROPERTIES OF AMORPHOUS THIN-FILMS PRODUCED BY ION MIXING [J].

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JOURNAL OF APPLIED PHYSICS, 1984, 56 (04) :1032-1035

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