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MAGNETICS AND MICROSTRUCTURE OF SPUTTERED NI80FE20/SIO2 MULTILAYER FILMS

被引：9
作者：
RUSSAK, MA
JAHNES, CV
RE, ME
WEBB, BC
MIRZAMAANI, SM
机构：
[1] IBM Research Divisior, T.J. Watson Research Center, NY 10598, Yorktown Heights
来源：
IEEE TRANSACTIONS ON MAGNETICS | 1990年 / 26卷 / 05期
关键词：
Films; -; Microstructure; Sputtering;
D O I：
10.1109/20.104922
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Multilayered Ni80Fe20/SiO2 films have been produced by sputter deposition. The effects of lamination on the bulk magnetic properties, microstructure and high frequency permeability of stacks with various Ni80Fe20 and SiO2 thicknesses were investigated. In general, laminated films with a total magnetic thickness of I.5,μm had significantly lower Hc and extended frequency response compared to unlaminated films of the same magnetic thickness. In addition the impact of lamination on domain configuration of yoke shaped structures was determined and excellent agreement with micromagnetic theoretical prediction obtained. © 1990 IEEE
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页码：2332 / 2334
页数：3
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