ON THE REACTION-KINETICS IN A MERCURY PHOTOSENSITIZED CVD OF A-SI-H FILMS

被引:23
作者
MATSUI, Y [1 ]
YUUKI, A [1 ]
MORITA, N [1 ]
TACHIBANA, K [1 ]
机构
[1] KYOTO INST TECHNOL,DEPT ELECTR,SAKYO KU,KYOTO 606,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 09期
关键词
D O I
10.1143/JJAP.26.1575
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:1575 / 1581
页数:7
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