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A SIMPLE APPARATUS FOR DC BIAS SPUTTERING
被引:3
作者
:
BOMER, RP
论文数:
0
引用数:
0
h-index:
0
BOMER, RP
BECK, AH
论文数:
0
引用数:
0
h-index:
0
BECK, AH
机构
:
来源
:
VACUUM
|
1970年
/ 20卷
/ 07期
关键词
:
D O I
:
10.1016/S0042-207X(70)80361-X
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
引用
收藏
页码:285 / &
相关论文
共 5 条
[1]
BECK AH, 1952, VACUUM, V2, P137
[2]
PREPARATION + PROPERTIES OF THIN-FILM HARD SUPERCONDUCTORS
EDGECUMBE, J
论文数:
0
引用数:
0
h-index:
0
EDGECUMBE, J
ANDERSON, DE
论文数:
0
引用数:
0
h-index:
0
ANDERSON, DE
ROSNER, LG
论文数:
0
引用数:
0
h-index:
0
ROSNER, LG
[J].
JOURNAL OF APPLIED PHYSICS,
1964,
35
(07)
: 2198
-
+
[3]
EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS
GERSTENBERG, D
论文数:
0
引用数:
0
h-index:
0
GERSTENBERG, D
CALBICK, CJ
论文数:
0
引用数:
0
h-index:
0
CALBICK, CJ
[J].
JOURNAL OF APPLIED PHYSICS,
1964,
35
(02)
: 402
-
&
[4]
BIAS SPUTTERING - ITS TECHNIQUES AND APPLICATIONS
SEEMAN, JM
论文数:
0
引用数:
0
h-index:
0
SEEMAN, JM
[J].
VACUUM,
1967,
17
(03)
: 129
-
&
[5]
DEPOSITION OF NIOBIUM THIN FILMS BY DC DIODE AND SUBSTRATE BIAS SPUTTERING
SOSNIAK, J
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ
SOSNIAK, J
[J].
JOURNAL OF APPLIED PHYSICS,
1968,
39
(09)
: 4157
-
&
←
1
→
共 5 条
[1]
BECK AH, 1952, VACUUM, V2, P137
[2]
PREPARATION + PROPERTIES OF THIN-FILM HARD SUPERCONDUCTORS
EDGECUMBE, J
论文数:
0
引用数:
0
h-index:
0
EDGECUMBE, J
ANDERSON, DE
论文数:
0
引用数:
0
h-index:
0
ANDERSON, DE
ROSNER, LG
论文数:
0
引用数:
0
h-index:
0
ROSNER, LG
[J].
JOURNAL OF APPLIED PHYSICS,
1964,
35
(07)
: 2198
-
+
[3]
EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS
GERSTENBERG, D
论文数:
0
引用数:
0
h-index:
0
GERSTENBERG, D
CALBICK, CJ
论文数:
0
引用数:
0
h-index:
0
CALBICK, CJ
[J].
JOURNAL OF APPLIED PHYSICS,
1964,
35
(02)
: 402
-
&
[4]
BIAS SPUTTERING - ITS TECHNIQUES AND APPLICATIONS
SEEMAN, JM
论文数:
0
引用数:
0
h-index:
0
SEEMAN, JM
[J].
VACUUM,
1967,
17
(03)
: 129
-
&
[5]
DEPOSITION OF NIOBIUM THIN FILMS BY DC DIODE AND SUBSTRATE BIAS SPUTTERING
SOSNIAK, J
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ
SOSNIAK, J
[J].
JOURNAL OF APPLIED PHYSICS,
1968,
39
(09)
: 4157
-
&
←
1
→