ND-YAG LASER MACHINING WITH MULTILEVEL RESIST KINOFORMS

被引：15

作者：

EKBERG, M

LARSSON, M

BOLLE, A

HARD, S

机构：

[1] Department of Applied Electron Physics, Chalmers University of Technology, Göteborg

来源：

APPLIED OPTICS | 1991年 / 30卷 / 25期

关键词：

LASER MACHINING; KINOFORM; PHASE HOLOGRAM;

D O I：

10.1364/AO.30.003604

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate that resist kinoforms can be used for laser micromachining. A 10-level resist kinoform, manufactured by electron-beam lithography, was shown to have a diffraction efficiency of 68%. Nine diffraction-limited holes were simultaneously drilled in 0.10-mm-thick stainless steel. Marking in a silicon wafer is also demonstrated.

引用

页码：3604 / 3606

页数：3

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