VIBRATIONAL-RELAXATION OF HIGHLY EXCITED SIF4 AND C6F5H BY AR

被引：5

作者：

BECK, KM ^{[1
]}

GORDON, RJ ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT CHEM,CHICAGO,IL 60680

来源：

JOURNAL OF CHEMICAL PHYSICS | 1990年 / 92卷 / 10期

关键词：

D O I：

10.1063/1.458372

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The vibrational relaxation of SiF4 and C6F 5H in an Ar bath was measured as a function of initial energy using the method of time-resolved optoacoustics. SiF4 was found to relax nonexponentially, with a rate constant which varied approximately as the vibrational energy raised to the 3/2 power. This behavior is similar to that observed earlier for SF6 + Ar below the bottleneck. In contrast, C6F5H was observed to decay exponentially, as expected for a large molecule in the quasicontinuum. These two types of behavior are discussed in the context of previously proposed propensity rules for the vibrational relaxation of highly excited molecules. © 1990 American Institute of Physics.

引用

页码：6011 / 6016

页数：6

共 41 条

[1] INFRARED MULTIPHOTON EXCITATION OF CF3I .1. TRANSIENT ULTRAVIOLET-ABSORPTION STUDY OF AFTER-PULSE DISSOCIATION AND EXCITED-STATE POPULATIONS [J].