共 41 条
VIBRATIONAL-RELAXATION OF HIGHLY EXCITED SIF4 AND C6F5H BY AR
被引:5
作者:
BECK, KM
[1
]
GORDON, RJ
[1
]
机构:
[1] UNIV ILLINOIS,DEPT CHEM,CHICAGO,IL 60680
关键词:
D O I:
10.1063/1.458372
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
The vibrational relaxation of SiF4 and C6F 5H in an Ar bath was measured as a function of initial energy using the method of time-resolved optoacoustics. SiF4 was found to relax nonexponentially, with a rate constant which varied approximately as the vibrational energy raised to the 3/2 power. This behavior is similar to that observed earlier for SF6 + Ar below the bottleneck. In contrast, C6F5H was observed to decay exponentially, as expected for a large molecule in the quasicontinuum. These two types of behavior are discussed in the context of previously proposed propensity rules for the vibrational relaxation of highly excited molecules. © 1990 American Institute of Physics.
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页码:6011 / 6016
页数:6
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