VIBRATIONAL-RELAXATION OF HIGHLY EXCITED SIF4 AND C6F5H BY AR

被引:5
作者
BECK, KM [1 ]
GORDON, RJ [1 ]
机构
[1] UNIV ILLINOIS,DEPT CHEM,CHICAGO,IL 60680
关键词
D O I
10.1063/1.458372
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The vibrational relaxation of SiF4 and C6F 5H in an Ar bath was measured as a function of initial energy using the method of time-resolved optoacoustics. SiF4 was found to relax nonexponentially, with a rate constant which varied approximately as the vibrational energy raised to the 3/2 power. This behavior is similar to that observed earlier for SF6 + Ar below the bottleneck. In contrast, C6F5H was observed to decay exponentially, as expected for a large molecule in the quasicontinuum. These two types of behavior are discussed in the context of previously proposed propensity rules for the vibrational relaxation of highly excited molecules. © 1990 American Institute of Physics.
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页码:6011 / 6016
页数:6
相关论文
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[41]   COMPARISON OF THE OPTOACOUSTIC AND HG TRACER METHODS FOR THE STUDY OF ENERGY-TRANSFER PROCESSES IN GAS-MIXTURES [J].
WALLINGTON, TJ ;
BRAUN, W ;
BECK, KM ;
GORDON, RJ .
JOURNAL OF PHYSICAL CHEMISTRY, 1988, 92 (13) :3839-3842