SPUTTERING AND SURFACE-COMPOSITION MODIFICATIONS OF TI DOPED GRAPHITE RG-TI AT TEMPERATURES UP TO 2000-K

被引：36

作者：

GARCIAROSALES, C

ROTH, J

BEHRISCH, R

机构：

[1] Max-Planck-Institut für Plasmaphysik, Euratom Association, München

来源：

JOURNAL OF NUCLEAR MATERIALS | 1994年 / 212卷 / pt B期

关键词：

D O I：

10.1016/0022-3115(94)91023-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Surface composition changes, sputtering yields, and hydrogen trapping and release at D-ion bombardment with energies between 50 eV and 1 keV at temperatures up to 2000 K have been investigated with well defined ion beams for the Ti doped graphite RG-Ti (1.7 at% Ti). Due to its high thermal conductivity and thermal shock resistance this material represents a promising candidate for use at high heat load plasma facing areas, such as limiters and divertor plates.

引用

页码：1211 / 1217

页数：7

共 19 条

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