XPS STUDIES ON THE CHARGE STATES OF CR AND CU ATOMS IMPLANTED INTO ALPHA-AL2O3 AND MGO SINGLE-CRYSTALS

被引:3
作者
FUTAGAMI, T [1 ]
AOKI, Y [1 ]
YODA, O [1 ]
NAGAI, S [1 ]
RUCK, DM [1 ]
机构
[1] GSI DARMSTADT,W-6100 DARMSTADT,GERMANY
关键词
D O I
10.1016/0168-583X(93)90757-W
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The charge state of Cr and Cu atoms implanted into alpha-Al2O3 and MgO single crystals has been studied by X-ray photoelectron spectroscopy (XPS). The implantation has been performed at 200 and 300 keV to doses of 10(16) to 10(18)/cm2. The implanted Cr atoms prefer to form aggregates in alpha-Al2O3 implanted to high doses while they are preferentially stabilized as Cr3+ in MgO. The presence of Cu2+ has been observed only in MgO and the Cu2+ fraction decreases with higher concentration of implanted Cu atoms.
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页码:1168 / 1170
页数:3
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