TICXN1-X COATINGS BY USING THE ARC EVAPORATION TECHNIQUE

被引：23

作者：

DAMOND, E ^{[1
]}

JACQUOT, P ^{[1
]}

PAGNY, J ^{[1
]}

机构：

[1] VIDION SA,HIT GRP,F-60530 NEUILLY EN THELLE,FRANCE

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 140卷

关键词：

D O I：

10.1016/0921-5093(91)90522-O

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

TiC(x)N1-x films were deposited using are-evaporated titanium and a reactive Mixture of CH4 and N2 gases. First, investigations were performed in a research physical vapour deposition (PVD) system. The films were characterized by X-ray diffractometry, scanning electron microscopy and energy-dispersive X-ray microanalysis for composition and crystal structures. Decorative properties were evaluated using colorimetry. The composition of the films is strongly dependent on the CH4:N2 flow rate ratio and on the total pressure during deposition. The composition is weakly dependent on the bias voltage and is not affected by the are current variation. Secondly, experiments were performed in an PVD 40 in system on two typical industrial loads. Compared to the TiN-coating process in the same system, the TiCN-coating process restricts the dimensions and the arrangement of the load. Thus the reproducibility of a specified composition depends on the load geometry.

引用

页码：838 / 841

页数：4