NANOMETER INDENTATION MEASUREMENTS ON METAL-CONTAINING AMORPHOUS HYDROGENATED CARBON-FILMS (ME-C-H)

被引:20
作者
FRYDA, M [1 ]
TAUBE, K [1 ]
KLAGES, CP [1 ]
机构
[1] PHILIPS GMBH,W-2000 HAMBURG 54,GERMANY
关键词
D O I
10.1016/0042-207X(90)93936-D
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In order to determine hardnesses and Young's moduli of thin films down to 1 μm thickness, nanometer indentation measurements were performed using an apparatus developed at the Philips Research Laboratories. An evaluation method described by Doerner and Nix was applied using a geometric correction to account for the non-ideal indenter tip geometry. In a preliminary study, the influence of the substrate material on the measured values was investigated for sputtered tungsten films. For MeC:H films the influences of the kind of incorporated metal, of the hydrocarbon gases used in the process, and of the deposition conditions are described. Results from hardness measurements on MeC:H films are compared to results from abrasive wear tests on the films. © 1990.
引用
收藏
页码:1291 / 1293
页数:3
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