NEW PHOTOCHEMICAL ROUTES TO GERMYLENES AND GERMENES AND KINETIC EVIDENCE CONCERNING THE GERMYLENE DIENE ADDITION MECHANISM

被引：42

作者：

BOBBITT, KL ^{[1
]}

MALONEY, VM ^{[1
]}

GASPAR, PP ^{[1
]}

机构：

[1] WASHINGTON UNIV,DEPT CHEM,ST LOUIS,MO 63130

来源：

ORGANOMETALLICS | 1991年 / 10卷 / 08期

关键词：

D O I：

10.1021/om00054a046

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

Upon 254-nm irradiation of phenylbis(trimethylsilyl)germanes, there is competition between two germylene-forming reactions, the unexpected elimination of phenyltrimethylsilane and the elimination of hexamethyldisilane. Irradiation of a phenylmonosilylgermane PhGeMe2SiMe3 leads to predominant elimination of PhSiMe3, forming dimethylgermylene Me2Ge:, accompanied by migration of Me3Si to the ortho position of the phenyl ring, forming a germene. Laser flash photolysis of PhGeMe2SiMe3 is a convenient source of Me3Ge:, and rate constants are reported for Me2Ge: addition to a series of dienes and other substrates. The kinetic data are in accord with 1,2-addition as the dominant pathway for addition of Me2Ge: to 1,3-dienes.

引用

页码：2772 / 2777

页数：6

共 36 条

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