SIC RECENT DEVELOPMENTS - MATERIAL, TECHNOLOGY, DEVICES

被引:13
作者
HELBIG, R
机构
[1] Institut Angewandte Physik, Universität Erlangen-Nürnberg, Erlangen, 8520
来源
PHYSICA SCRIPTA | 1991年 / T35卷
关键词
D O I
10.1088/0031-8949/1991/T35/042
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
SiC is a very promising wide gap material. Here we review the present status of our understanding of its electronic structure and properties of crystal growth and of device fabrication and characteristics. Be patient - it is the right stuff! W. Shockley at the 1st International SiC conference 1959 (cited after W. J. Choyke).
引用
收藏
页码:194 / 200
页数:7
相关论文
共 40 条
  • [1] INTER-LAYER INTERACTIONS AND THE ORIGIN OF SIC POLYTYPES
    CHENG, C
    NEEDS, RJ
    HEINE, V
    [J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1988, 21 (06): : 1049 - 1063
  • [2] CHINONE Y, 1989, ELECTROTECHNICAL SOC, V89, P729
  • [3] CHOYKE WJ, 1990, IN PRESS NATO ASI SE
  • [4] CALCULATED GROUND-STATE PROPERTIES OF SILICON-CARBIDE
    CHURCHER, N
    KUNC, K
    HEINE, V
    [J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1986, 19 (23): : 4413 - 4426
  • [5] DAVIS R, IN PRESS
  • [6] CRITICAL-EVALUATION OF THE STATUS OF THE AREAS FOR FUTURE-RESEARCH REGARDING THE WIDE BAND-GAP SEMICONDUCTORS DIAMOND, GALLIUM NITRIDE AND SILICON-CARBIDE
    DAVIS, RF
    SITAR, Z
    WILLIAMS, BE
    KONG, HS
    KIM, HJ
    PALMOUR, JW
    EDMOND, JA
    RYU, J
    GLASS, JT
    CARTER, CH
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1988, 1 (01): : 77 - 104
  • [7] DUBROVSKIJ GD, 1989, FIZ TVERD TELA+, V31, P10
  • [8] GLASOW P, SPIE, V868
  • [9] Hagen S. H., 1973, Journal of Luminescence, V8, P18, DOI 10.1016/0022-2313(73)90032-X
  • [10] HELBIG R, 1989, ELECTROCHEMICAL SOC, V89, P695