MODELING AND SIMULATION OF HIGH-DENSITY PLASMAS

被引：32

作者：

GRAVES, DB

WU, HM

PORTEOUS, RK

机构：

[1] University of California, CA, 94720, Berkeley

[2] Research School of Physical Sciences and Engineering, Australian National University, Canberra, ACT, 2601

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 6B期

关键词：

PLASMA SIMULATION; HIGH DENSITY PLASMA SOURCES; ELECTRON CYCLOTRON RESONANCE;

D O I：

10.1143/JJAP.32.2999

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present a model of an ECR plasma in a cylindrical (z, r) geometry with resonant zone near the substrate surface. The model combines a hybrid (particle ion-fluid electron) treatment of plasma transport with an ad-hoc model of microwave power deposition. The model is used to test the effect of the radial profile of microwave power on the spatial profiles of plasma parameters: plasma density, plasma potential and electron temperature. It is shown that for uniformity of ion flux at the substrate surface, microwave power must be peaked off axis.

引用

页码：2999 / 3006

页数：8

共 30 条

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