METAL SILICON REACTIONS INDUCED BY CW SCANNED LASER AND ELECTRON-BEAMS

被引：35

作者：

SHIBATA, T

SIGMON, TW

REGOLINI, JL

GIBBONS, JF

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 03期

关键词：

D O I：

10.1149/1.2127473

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：637 / 644

页数：8

共 20 条

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