SILICON-BASED OPTOELECTRONICS

被引:641
作者
SOREF, RA
机构
[1] Rome Laboratory (AFMC), Electromagnetics and Reliability Directorate, Hanscom Air Force Base, MA
关键词
D O I
10.1109/5.248958
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The decade of the 1990's is an opportune time for scientists and engineers to create cost-effective silicon ''superchips'' that merge silicon photonics with advanced silicon electronics on a silicon substrate. We can expect significant electrooptical devices from Column IV materials (Si, Ge, C, and Sn) for a host of applications. The best devices will use strained-layer epitaxy, doped heterostructures, and bandgap engineering of quantum-confined structures. This paper reviews Si-based photonic components and optoelectronic integration techniques, both hybrid and monolithic.
引用
收藏
页码:1687 / 1706
页数:20
相关论文
共 216 条
  • [1] ENGINEERING THE FUTURE OF ELECTRONICS
    ABSTREITER, G
    [J]. PHYSICS WORLD, 1992, 5 (03) : 36 - 39
  • [2] ALBARES DJ, 1986, SPIE P, V704, P23
  • [3] [Anonymous], 1985, HDB OPTICAL CONSTANT
  • [4] ARIENZO M, 1992, FAL MAT RES SOC M AB, P170
  • [5] VERTICALLY INTEGRATED HIGH-SILICA CHANNEL WAVE-GUIDES ON SI
    BARBAROSSA, G
    LAYBOURN, PJR
    [J]. ELECTRONICS LETTERS, 1992, 28 (05) : 437 - 438
  • [6] SILICON-BASED SEMICONDUCTOR HETEROSTRUCTURES - COLUMN-IV BANDGAP ENGINEERING
    BEAN, JC
    [J]. PROCEEDINGS OF THE IEEE, 1992, 80 (04) : 571 - 587
  • [7] DESIGN AND FABRICATION OF ASYMMETRIC STRAINED-LAYER MIRRORS FOR OPTOELECTRONIC APPLICATIONS
    BEAN, JC
    PETICOLAS, LJ
    HULL, R
    WINDT, DL
    KUCHIBHOTLA, R
    CAMPBELL, JC
    [J]. APPLIED PHYSICS LETTERS, 1993, 63 (04) : 444 - 446
  • [8] BEAN JC, 1992, FAL MAT RES SOC M AB, P158
  • [9] BLOOM DM, 1993, FEB DARPA OPT REV C
  • [10] OPTICAL-EMISSION FROM IMPURITIES WITHIN AN EPITAXIAL-SILICON OPTICAL WAVE-GUIDE
    BROWN, TG
    BRADFIELD, PL
    HALL, DG
    SOREF, RA
    [J]. OPTICS LETTERS, 1987, 12 (09) : 753 - 755