SOME EFFECTS OF PLANAR DEFECTS NEAR SI-SIO2 INTERFACE ON ELECTRICAL-PROPERTIES OF SILICON-ON-SAPPHIRE-MOS DEVICES

被引:5
作者
ABRAHAMS, MS
HAM, WE
机构
关键词
D O I
10.1063/1.90500
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:773 / 775
页数:3
相关论文
共 7 条
[1]   CROSS-SECTIONAL ELECTRON-MICROSCOPY OF SILICON ON SAPPHIRE [J].
ABRAHAMS, MS ;
BUIOCCHI, CJ .
APPLIED PHYSICS LETTERS, 1975, 27 (06) :325-327
[2]   CROSS-SECTIONAL SPECIMENS FOR TRANSMISSION ELECTRON-MICROSCOPY [J].
ABRAHAMS, MS ;
BUIOCCHI, CJ .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (08) :3315-3316
[3]  
CULLIS AG, 1972, THESIS OXFORD U
[4]  
Ham W. E., 1976, Electrochemical Society Fall Meeting. (Extended abstracts only received), P462
[5]  
HAM WE, 1977, RCA REV, V38, P351
[6]  
HAM WE, 1969, HETEROEPITAXIAL SEMI, P568
[7]   SAPPHIRE SUBSTRATE MISORIENTATION AND SOS-MOS TRANSISTOR PERFORMANCE [J].
WEITZEL, CE ;
SMITH, RT .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (07) :1080-1086