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SAPPHIRE SUBSTRATE MISORIENTATION AND SOS-MOS TRANSISTOR PERFORMANCE
被引:15
作者
:
WEITZEL, CE
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
WEITZEL, CE
[
1
]
SMITH, RT
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
SMITH, RT
[
1
]
机构
:
[1]
RCA LABS,PRINCETON,NJ 08540
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1977年
/ 124卷
/ 07期
关键词
:
D O I
:
10.1149/1.2133487
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:1080 / 1086
页数:7
相关论文
共 11 条
[1]
CROSS-SECTIONAL ELECTRON-MICROSCOPY OF SILICON ON SAPPHIRE
ABRAHAMS, MS
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
ABRAHAMS, MS
BUIOCCHI, CJ
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
BUIOCCHI, CJ
[J].
APPLIED PHYSICS LETTERS,
1975,
27
(06)
: 325
-
327
[2]
RESIDUAL STRESS IN EPITAXIAL SILICON FILM ON SAPPHIRE
ANG, CY
论文数:
0
引用数:
0
h-index:
0
ANG, CY
MANASEVIT, HM
论文数:
0
引用数:
0
h-index:
0
MANASEVIT, HM
[J].
SOLID-STATE ELECTRONICS,
1965,
8
(12)
: 994
-
+
[3]
CULLEN CW, 1971, J CRYSTAL GROWTH, V9, P107
[4]
DEFORMATION OF AND STRESS IN EPITAXIAL SILICON FILMS ON SINGLE-CRYSTAL SAPPHIRE
DUMIN, DJ
论文数:
0
引用数:
0
h-index:
0
DUMIN, DJ
[J].
JOURNAL OF APPLIED PHYSICS,
1965,
36
(09)
: 2700
-
&
[5]
Frenkel J, 1938, PHYS REV, V54, P647, DOI 10.1103/PhysRev.54.647
[6]
HSU ST, 1975, RCA REV, V36, P240
[7]
STRESS-INDUCED ANISOTROPY IN ELECTRICAL PROPERTIES OF SI-AL2O3
HUGHES, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
ROCKWELL INT CORP,3370 MIRALOMA AVE,ANAHEIM,CA 92803
ROCKWELL INT CORP,3370 MIRALOMA AVE,ANAHEIM,CA 92803
HUGHES, AJ
[J].
JOURNAL OF APPLIED PHYSICS,
1975,
46
(07)
: 2849
-
2863
[8]
LOW-THRESHOLD LOW-POWER CMOS-SOS FOR HIGH-FREQUENCY COUNTER APPLICATIONS
IPRI, AC
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, TECH STAFF, PRINCETON, NJ 08540 USA
IPRI, AC
SARACE, JC
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, TECH STAFF, PRINCETON, NJ 08540 USA
SARACE, JC
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1976,
11
(02)
: 329
-
336
[9]
ELECTRICAL PROPERTIES OF SILICON FILMS ON SAPPHIRE USING MOS HALL TECHNIQUE
IPRI, AC
论文数:
0
引用数:
0
h-index:
0
IPRI, AC
[J].
JOURNAL OF APPLIED PHYSICS,
1972,
43
(06)
: 2770
-
+
[10]
EFFECT OF ARSENIC IN IMPROVING LIFETIME IN SILICON-ON-SAPPHIRE FILMS
MCGREIVY, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024
UNIV CALIF,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024
MCGREIVY, DJ
VISWANAT.CR
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024
UNIV CALIF,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024
VISWANAT.CR
[J].
APPLIED PHYSICS LETTERS,
1974,
25
(09)
: 505
-
506
←
1
2
→
共 11 条
[1]
CROSS-SECTIONAL ELECTRON-MICROSCOPY OF SILICON ON SAPPHIRE
ABRAHAMS, MS
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
ABRAHAMS, MS
BUIOCCHI, CJ
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
BUIOCCHI, CJ
[J].
APPLIED PHYSICS LETTERS,
1975,
27
(06)
: 325
-
327
[2]
RESIDUAL STRESS IN EPITAXIAL SILICON FILM ON SAPPHIRE
ANG, CY
论文数:
0
引用数:
0
h-index:
0
ANG, CY
MANASEVIT, HM
论文数:
0
引用数:
0
h-index:
0
MANASEVIT, HM
[J].
SOLID-STATE ELECTRONICS,
1965,
8
(12)
: 994
-
+
[3]
CULLEN CW, 1971, J CRYSTAL GROWTH, V9, P107
[4]
DEFORMATION OF AND STRESS IN EPITAXIAL SILICON FILMS ON SINGLE-CRYSTAL SAPPHIRE
DUMIN, DJ
论文数:
0
引用数:
0
h-index:
0
DUMIN, DJ
[J].
JOURNAL OF APPLIED PHYSICS,
1965,
36
(09)
: 2700
-
&
[5]
Frenkel J, 1938, PHYS REV, V54, P647, DOI 10.1103/PhysRev.54.647
[6]
HSU ST, 1975, RCA REV, V36, P240
[7]
STRESS-INDUCED ANISOTROPY IN ELECTRICAL PROPERTIES OF SI-AL2O3
HUGHES, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
ROCKWELL INT CORP,3370 MIRALOMA AVE,ANAHEIM,CA 92803
ROCKWELL INT CORP,3370 MIRALOMA AVE,ANAHEIM,CA 92803
HUGHES, AJ
[J].
JOURNAL OF APPLIED PHYSICS,
1975,
46
(07)
: 2849
-
2863
[8]
LOW-THRESHOLD LOW-POWER CMOS-SOS FOR HIGH-FREQUENCY COUNTER APPLICATIONS
IPRI, AC
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, TECH STAFF, PRINCETON, NJ 08540 USA
IPRI, AC
SARACE, JC
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, TECH STAFF, PRINCETON, NJ 08540 USA
SARACE, JC
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1976,
11
(02)
: 329
-
336
[9]
ELECTRICAL PROPERTIES OF SILICON FILMS ON SAPPHIRE USING MOS HALL TECHNIQUE
IPRI, AC
论文数:
0
引用数:
0
h-index:
0
IPRI, AC
[J].
JOURNAL OF APPLIED PHYSICS,
1972,
43
(06)
: 2770
-
+
[10]
EFFECT OF ARSENIC IN IMPROVING LIFETIME IN SILICON-ON-SAPPHIRE FILMS
MCGREIVY, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024
UNIV CALIF,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024
MCGREIVY, DJ
VISWANAT.CR
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024
UNIV CALIF,SCH ENGN & APPL SCI,LOS ANGELES,CA 90024
VISWANAT.CR
[J].
APPLIED PHYSICS LETTERS,
1974,
25
(09)
: 505
-
506
←
1
2
→