LOW-ENERGY ELECTRON OSCILLATIONS DURING EPITAXIAL-GROWTH OF THIN-FILMS

被引：15

作者：

KERKMANN, D

PESCIA, D

KREWER, JW

VESCOVO, E

机构：

[1] POLITECN MILAN, IST FIS, I-20100 MILAN, ITALY

[2] UNIV DUISBURG GESAMTHSCH, FACHBEREICH 10, W-4100 DUISBURG, GERMANY

[3] FORSCHUNGSZENTRUM JULICH, IFF, W-5170 JULICH 1, GERMANY

来源：

ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER | 1991年 / 85卷 / 02期

关键词：

D O I：

10.1007/BF01313234

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

We have measured the specularly reflected intensity of low energy (12 eV) electrons as a function of the deposition time during the growth of Cu-thin films on fcc-Co(100) and Co-thin films on Cu(100). The measured curves show pronounced periodical oscillations. The origin of these oscillations is identified as arising from the interference of the electron waves reflected at the vacuum-film and film-substrate boundaries.

引用

页码：311 / 314

页数：4

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