REDEPOSITION OF SPUTTERED MATERIAL IN A GLOW-DISCHARGE LAMP MEASURED BY MEANS OF AN ION MICROPROBE MASS ANALYZER

被引:4
作者
FERREIRA, NP
BUGER, PA
机构
来源
ZEITSCHRIFT FUR NATURFORSCHUNG SECTION A-A JOURNAL OF PHYSICAL SCIENCES | 1978年 / 33卷 / 02期
关键词
D O I
10.1515/zna-1978-0206
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:141 / 144
页数:4
相关论文
共 12 条
[1]   HEAVY-ION SPUTTERING YIELDS OF GOLD - FURTHER EVIDENCE OF NONLINEAR EFFECTS [J].
ANDERSEN, HH ;
BAY, HL .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (06) :2416-2422
[2]   SECONDARY ION YIELDS NEAR 1 FOR SOME CHEMICAL COMPOUNDS [J].
BENNINGHOVEN, A ;
MUELLER, A .
PHYSICS LETTERS A, 1972, A-40 (02) :169-+
[3]   SURFACE INVESTIGATION OF SOLIDS BY STATICAL METHOD OF SECONDARY ION MASS SPECTROSCOPY (SIMS) [J].
BENNINGHOVEN, A .
SURFACE SCIENCE, 1973, 35 (01) :427-457
[4]   STUDIES OF SPUTTERING IN A GLOW-DISCHARGE FOR SPECTROCHEMICAL ANALYSIS [J].
BOUMANS, PWJ .
ANALYTICAL CHEMISTRY, 1972, 44 (07) :1219-&
[5]   GLOW-DISCHARGE MASS-SPECTROMETRY - TECHNIQUE FOR DETERMINING ELEMENTAL COMPOSITION PROFILES IN SOLIDS [J].
COBURN, JW ;
TAGLAUER, E ;
KAY, E .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) :1779-1786
[7]  
NAGANUMA K, 1977, BUNSEKI KAGAKU, V26, P25
[8]   QUANTUM-MECHANICAL MODEL FOR IONIZATION AND EXCITATION OF ATOMS DURING SPUTTERING [J].
SCHROEER, JM ;
RHODIN, TN ;
BRADLEY, RC .
SURFACE SCIENCE, 1973, 34 (03) :571-580
[9]   THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J].
SIGMUND, P .
PHYSICAL REVIEW, 1969, 184 (02) :383-+
[10]   INVESTIGATION OF SPUTTERING OF ALUMINUM USING ATOMIC-ABSORPTION SPECTROSCOPY [J].
STIRLING, AJ ;
WESTWOOD, WD .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (02) :742-&