ION AND ELECTRON-ENERGY ANALYSIS AT A SURFACE IN AN RF DISCHARGE

被引：120

作者：

INGRAM, SG ^{[1
]}

BRAITHWAITE, NSJ ^{[1
]}

机构：

[1] OPEN UNIV,MAT DISCIPLINE,MILTON KEYNES MK7 6AA,BUCKS,ENGLAND

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1988年 / 21卷 / 10期

关键词：

Collisional Scattering - Ion Velocity Distribution - Plasma Etching - RF Discharge;

D O I：

10.1088/0022-3727/21/10/005

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1496 / 1503

页数：8

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