MO CVD OF NOBLE-METALS

被引：34

作者：

IGUMENOV, IK

机构：

来源：

JOURNAL DE PHYSIQUE IV | 1995年 / 5卷 / C5期

关键词：

D O I：

10.1051/jphyscol:1995556

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The state of the art in research and application of processes of chemical vapour deposition of noble metal (Pt, Pd, Rh, Ir, Ru, Au) coatings is considered. Systematization of known experimental data on synthesis, thermal properties and saturated vapour pressure of volatile compounds of noble metals with organic ligands is provided. The processes of CVD of noble metals were analized from general requirements to precursors. It is shown that chelate or mixed-ligand noble metal complexes and, in particular beta-diketonate derivatives due to their thermal properties are the most suitable for deposition of noble metal thick films.

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页码：489 / 496

页数：8

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