CONTROLLED SUBLIMATION GROWTH OF SINGLE CRYSTALLINE 4H-SIC AND 6H-SIC AND IDENTIFICATION OF POLYTYPES BY X-RAY-DIFFRACTION

被引:90
作者
KANAYA, M
TAKAHASHI, J
FUJIWARA, Y
MORITANI, A
机构
[1] Electronics R and D Laboratories, Nippon Steel Corporation, Nakahara-ku, Kawasaki 211
关键词
D O I
10.1063/1.104443
中图分类号
O59 [应用物理学];
学科分类号
摘要
Polytype-controlled crystal growth of SiC was carried out by using a sublimation method. Production yields as high as 80% and 85% for 4H and 6H single crystals were obtained, respectively. We observed in x-ray diffraction pattern of SiC that space-group-forbidden peaks appear periodically among (0001) peaks. Their intensity is strong enough to be distinguished. These peaks represent the periodicity along the c axis of each polytypic modification of SiC. X-ray diffractometry using these peaks is quite useful and easy for a clear identification of the SiC polytypes.
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页码:56 / 58
页数:3
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