STOICHIOMETRY AND PROFILING OF SURFACE-LAYERS BY MEANS OF TOF-E ERDA AND RBS

被引:20
作者
ARAI, E
FUNAKI, H
KATAYAMA, M
SHIMIZU, K
机构
[1] Tokyo Institute of Technology, Tokyo- Meguroku
关键词
D O I
10.1016/0168-583X(92)96076-B
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
An experimental method is established for stoichiometric analysis and profiling of the surface region of solids by adapting a TOF-E counter telescope to acquire spectra of the atomic mass and the kinetic energy of recoils. A 10 MeV Cl-35 beam, delivered by a small tandem, bombards samples to eject the recoils. The samples include Ta2O5 films deposited onto Si substrates. Advantages and the limit of applicability of the present method are discussed.
引用
收藏
页码:202 / 206
页数:5
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