ELECTROCHEMICAL AND PHOTOELECTROCHEMICAL DEPOSITION OF THALLIUM(III) OXIDE THIN-FILMS

被引：66

作者：

PHILLIPS, RJ

SHANE, MJ

SWITZER, JA

机构：

来源：

JOURNAL OF MATERIALS RESEARCH | 1989年 / 4卷 / 04期

关键词：

D O I：

10.1557/JMR.1989.0923

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：923 / 929

页数：7

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