EFFECT OF HEATING SINGLE CRYSTAL COPPER IN H2 AND N2 ON THIN-FILM OXIDATION KINETICS

被引:6
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BRADLEY, WW
UHLIG, HH
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10.1149/1.2426702
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O646 [电化学、电解、磁化学];
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081704 ;
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页码:669 / &
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共 33 条
[1]  
ANDRADE E, 1935, PHIL T ROYAL SOC, VA235, P69
[2]  
BENARD J, 1958, CR HEBD ACAD SCI, V246, P756
[3]  
Campbell W. E., 1939, T ELECTROCHEM SOC, V76, P303
[4]  
CHALMERS B, 1948, P R SOC, VA193, P465
[5]  
EICHENAUER W, 1957, Z METALLKD, V48, P373
[6]   The etching of copper by oxygen. [J].
Elam, CF ;
Tipper, GH .
TRANSACTIONS OF THE FARADAY SOCIETY, 1936, 32 (02) :1604-1613
[7]   THE FORMATION OF NI3O IN SINGLE CRYSTALS [J].
FARNSWORTH, HE .
APPLIED PHYSICS LETTERS, 1963, 2 (10) :199-200
[8]  
Gronlund F., 1956, J CHIM PHYS PCB, V53, DOI 10.1051/jcp/1956530660
[9]  
Gwathmey A.T., 1940, J CHEM PHYS, V8, P569
[10]   The reaction of gases on the surface of a single crystal of copper I Oxygen [J].
Gwathmey, AT ;
Benton, AF .
JOURNAL OF PHYSICAL CHEMISTRY, 1942, 46 (08) :969-980