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EFFECT OF HEATING SINGLE CRYSTAL COPPER IN H2 AND N2 ON THIN-FILM OXIDATION KINETICS

被引：6
作者：
BRADLEY, WW
UHLIG, HH
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1967年 / 114卷 / 07期
关键词：
D O I：
10.1149/1.2426702
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：669 / &
相关论文
共 33 条
[31]  
Williams E., 1958, VACANCIES OTHER POIN, V23, P131
[32]   THE RATES OF OXIDATION OF SEVERAL FACES OF A SINGLE CRYSTAL OF COPPER AS DETERMINED WITH ELLIPTICALLY POLARIZED LIGHT [J].
YOUNG, FW ;
CATHCART, JV ;
GWATHMEY, AT .
ACTA METALLURGICA, 1956, 4 (02) :145-152
[33]   DEVELOPMENT OF FACETS, SPIRALS, AND ETCH PITS ON COPPER CRYSTALS BY HEATING TO HIGH TEMPERATURES IN HIGH VACUA [J].
YOUNG, FW ;
GWATHMEY, AT .
JOURNAL OF APPLIED PHYSICS, 1960, 31 (02) :225-230
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