EFFECTS OF PROCESS ERRORS ON THE DIFFRACTION CHARACTERISTICS OF BINARY DIELECTRIC GRATINGS

被引：13

作者：

POMMET, DA ^{[1
]}

GRANN, EB ^{[1
]}

MOHARAM, MG ^{[1
]}

机构：

[1] UNIV CENT FLORIDA,CTR RES & EDUC OPT & LASERS,ORLANDO,FL 32816

来源：

APPLIED OPTICS | 1995年 / 34卷 / 14期

关键词：

DIFFRACTIVE OPTICS; OPTICAL FABRICATION; DIFFRACTION MATHEMATICAL MODELS;

D O I：

10.1364/AO.34.002430

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The effects of fabrication errors on the predicted performance of surface-relief phase gratings are analyzed with a rigorous vector diffraction technique. For binary elements, errors in the dimensions of the profile [depth, linewidth (fill factor), and grating period], as well as errors in the shape of the profile, are investigated. It is shown that the dimension errors do not have a significant effect on grating performance when the grating is designed for either maximum or minimum diffraction efficiency. A trapezoid is used to model the shape error of the profile. For the first time, design rules that significantly reduce the effects of any shape error are presented.

引用

页码：2430 / 2435

页数：6

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