HETEROJUNCTIONS OF SOLID C-60 AND CRYSTALLINE SILICON - RECTIFYING PROPERTIES AND ENERGY-BAND MODELS

被引:18
作者
CHEN, KM [1 ]
JIA, YQ [1 ]
JIN, SX [1 ]
WU, K [1 ]
ZHAO, WB [1 ]
LI, CY [1 ]
GU, ZN [1 ]
ZHOU, XH [1 ]
机构
[1] BEIJING UNIV,DEPT CHEM,BEIJING 100871,PEOPLES R CHINA
关键词
D O I
10.1088/0953-8984/7/14/004
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Heterojunctions of undoped solid C-60 and n- or p-type-doped crystalline Si have been obtained. Current-voltage measurements show that both C-60/n-Si and C-60/p-Si contacts are rectifying but their directions of rectification are opposite. Thermal activation measurements at a fixed foward bias show an exponential dependence of current on the reciprocal of temperature, from which we determine the effective barrier height as 0.30 eV for C-60/n-Si and 0.48 eV for C-60/p-Si. Using energy-band models for heterojunctions we assign values to the positions of the conduction and valence bands of the solid C-60 relative to those of crystalline Si and derive the electron affinity and band gap of solid C-60 film as 3.92 eV and <1.72 eV, respectively.
引用
收藏
页码:L201 / L207
页数:7
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