OPTICAL ANALYSIS OF AL-LAYER OXIDATION DURING NB/AL2O3-AL/NB JOSEPHSON-JUNCTION FABRICATION

被引：2

作者：

DOLATA, R

NEUHAUS, M

JUTZI, W

机构：

[1] Institut für Elektrotechnische Grundlagen der Informatik, Universität Karlsruhe, D-76187 Karlsruhe

来源：

CRYOGENICS | 1994年 / 34卷 / 10期

关键词：

NB/AL2O3-AL/NB; JOSEPHSON JUNCTIONS; BARRIER GROWTH;

D O I：

10.1016/0011-2275(94)90069-8

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

The oxidation of thin Al layers on niobium has been investigated by reflectivity measurements. The simple experimental set-up allows for in situ observation of tunnel barrier growth with good time resolution. The dynamics of the Al2O3 layer growth is examined as a function of O-2 pressure. The observed reflectivity change during oxidation is correlated with the critical Josephson current density.

引用

页码：833 / 835

页数：3

共 6 条

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