LASER REFLECTION MEASUREMENTS FOR END-POINT DETECTION AND ANALYSIS IN NB/AL2O3-AL/NB JOSEPHSON CIRCUIT FABRICATION

被引:7
作者
DOLATA, R
NEUHAUS, M
JUTZI, W
机构
[1] Institut für Elektrotechnische Grundlagen der Informatik, Universität Karlsruhe, D-76187 Karlsruhe 21
来源
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 1993年 / 214卷 / 3-4期
关键词
D O I
10.1016/0921-4534(93)90839-I
中图分类号
O59 [应用物理学];
学科分类号
摘要
A simple optical reflection measurement arrangement is described which allows one to monitor the reflectivity of etched layers. The application of this method for end point detection in fabricating Josephson circuits based on Nb/Al2O3-Al/Nb trilayers is presented. Moreover, the thin intermediate Al layer can be examined by reflection analysis during etching of the complete trilayer. The application of reflectivity measurements to the fabrication of vertically stacked Josephson devices is discussed.
引用
收藏
页码:365 / 370
页数:6
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