OPTICAL END-POINT DETECTION OF ETCHED YBCO FILMS

被引：2

作者：

DOLATA, R

FISCHER, M

JUTZI, W

机构：

[1] Institut für Electrotechnische Grundlagen der Informatik, Universität Karlsruhe, D-7500 Karlsruhe 21

来源：

PHYSICA C | 1992年 / 191卷 / 3-4期

关键词：

D O I：

10.1016/0921-4534(92)90951-8

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A simple end point detection method for dry etching of YBCO layers on uniform substrates is presented. Reflectivity measurements of the etched layer with a He-Ne laser beam provides process control and end point detection. A possible application of this method to YBCO layers on substrates with buffer layers is discussed.

引用

页码：525 / 529

页数：5

共 10 条

[1]

Born M., 1984, PRINCIPLES OPTICS

[2]

BUSTA HH, 1979, SOLID STATE TECHNOL, V22, P61

[3] FURTHER IMPROVEMENTS IN END-POINT DETECTION USING A WIDE ANGLE ION-BEAM SOURCE [J].

DEAN, AB ;

HEATH, M ;

BRAYFORD, M .

VACUUM, 1988, 38 (06) :499-502

[4]

GUTKNECHT M, 1990, THESIS U KARLSRUHE

[5] MONITORING SECONDARY IONS DURING ION ETCHING [J].

HOSAKA, S ;

SAKUDO, N ;

HASHIMOTO, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (03) :913-917

[6] OPTICAL-PROPERTIES RELATED TO LOCAL STRUCTURES IN CU-O SUPERCONDUCTORS [J].

KELLY, MK ;

BARBOUX, P ;

TARASCON, JM ;

ASPNES, DE ;

MORRIS, PA ;

BONNER, WA .

PHYSICA C, 1989, 162 :1123-1124

[7] ENDPOINT DETECTION IN ION MILLING PROCESSES BY SPUTTER-INDUCED OPTICAL-EMISSION SPECTROSCOPY [J].

LU, C ;

DORIAN, M ;

TABEI, M ;

ELSEA, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :481-484

[8]

MARCOUX PJ, 1981, SOLID STATE TECHNOL, V24, P115

[9] OFF-AXIS SPUTTERED Y1BA2CU3O7-DELTA FILMS ON NDGAO3 [J].

SCHERER, T ;

HERWIG, R ;

MARIENHOFF, P ;

NEUHAUS, M ;

VOGT, A ;

JUTZI, W .

CRYOGENICS, 1991, 31 (11) :975-978

[10] POLARIZED REFLECTANCE SPECTRA OF A (001) SURFACE OF YBA2CU3O7 BEFORE AND AFTER DETWINNING [J].

ZIBOLD, A ;

DURRLER, M ;

GESERICH, HP ;

ERB, A ;

MULLERVOGT, G .

PHYSICA C, 1990, 171 (1-2) :151-155

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