UNIFORM POLYMER COATING TECHNIQUE FOR AN ETCH-BACK PLANARIZATION PROCESS USING LOW-MOLECULAR WEIGHT POLYMERS

被引:18
作者
GOKAN, H
MUKAINARU, M
ENDO, N
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关键词
D O I
10.1149/1.2095760
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1019 / 1021
页数:3
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共 13 条
[1]   PLANARIZATION OF PHOSPHORUS-DOPED SILICON DIOXIDE [J].
ADAMS, AC ;
CAPIO, CD .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (02) :423-429
[2]  
ALLEN R, 1982, J ELECTROCHEM SOC, V129, P1381
[3]  
Bender G, 1970, MACROMOLECULES, V3, P128
[4]   NEW PLANAR PROCESS FOR 2-MU-M BUBBLE-DEVICES WITH THIN-FILM DETECTOR [J].
GOKAN, H ;
ESHO, S ;
TSUGE, H ;
FUJIWARA, S .
IEEE TRANSACTIONS ON MAGNETICS, 1980, 16 (05) :1044-1046
[5]   REACTIVE ION ETCHING OF SIO2 WITH VERTICAL SIDEWALLS AND ITS APPLICATION TO ION-IMPLANTATION MASKS FOR BUBBLE-DEVICES [J].
GOKAN, H ;
MUKAINARU, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (06) :1620-1624
[6]   LSI SURFACE LEVELING BY RF SPUTTER ETCHING [J].
HOMMA, Y ;
HARADA, S ;
KAJI, T .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (09) :1531-1533
[7]   ION MILLING PLANARIZATION FOR MAGNETIC-BUBBLE DEVICES [J].
HOU, TW ;
MOGAB, CJ ;
WAGNER, RS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (04) :1801-1805
[8]   PLANARIZING OF PHOSPHOSILICATE GLASS-FILMS ON PATTERNED SILICON-WAFERS [J].
JOHNSON, LF ;
INGERSOLL, KA ;
DALTON, JV .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (02) :487-489
[9]  
LAVERGNE DB, 1985, P SOC PHOTO-OPT INST, V539, P115
[10]  
TANIGAKI K, 1984, ACS SYM SER, V242, P177