NEW MICROWAVE ION-SOURCE FOR MULTIPLY CHARGED ION-BEAM PRODUCTION

被引：7

作者：

TOKIGUCHI, K

AMEMIYA, K

KOIKE, H

SAKUDO, N

SEKI, T

机构：

[1] Hitachi Ltd, Kokubunji, Jpn, Hitachi Ltd, Kokubunji, Jpn

来源：

VACUUM | 1988年 / 38卷 / 06期

关键词：

D O I：

10.1016/0042-207X(88)90593-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：487 / 490

页数：4

共 12 条

[1]

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[2]

Iwaki M., 1983, Proceedings of the International Ion Engineering Congress. The 7th Symposium (1983 International) on Ion Sources and Ion Assisted Technology (ISIAT '83) and the 4th International Conference on Ion and Plasma Assisted Techniques (IPAT '83), P1793

[3]

KAPCHINSKIJ IM, 1970, PRIBORY TEKH EKSP, V2

[4] PERFORMANCE OF THE LBL ECR ION-SOURCE [J].

LYNEIS, CM .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 10-1 (MAY) :775-778

[5]

MCKENNA C, 1986, SEMICOND INT APR, P101

[6]

Nakanishi T., 1987, Particle Accelerators, V20, P183

[7] HIGH-CURRENT ION IMPLANTER USING A MICROWAVE ION-SOURCE [J].

SAKUDO, N ;

TOKIGUCHI, K ;

KOIKE, H ;

KANOMATA, I .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1983, 54 (06) :681-684

[8]

SAKUDO N, 1986, NUCL INSTRUM METH B, V21, P168

[9]

SAKUDO N, 1986, 6TH P INT C ION IMPL

[10]

SPITZER L, 1956, PHYSICS FULLY IONIZE

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