MICROFABRICATION AND EVALUATION OF DIFFRACTIVE OPTICAL FILTERS PREPARED BY REACTIVE SPUTTER ETCHING

被引:12
作者
KNOP, K
LEHMANN, HW
WIDMER, R
机构
[1] Laboratories RCA Ltd., Zurich
关键词
D O I
10.1063/1.326499
中图分类号
O59 [应用物理学];
学科分类号
摘要
Single or linearly superimposed square-wave surface-relief patterns in a transparent plate yield optical transmission characteristics similar to those of interference filters. Reactive sputter etching of fused quartz in CHF 3 using Shipley 1350 H photoresist as an etch mask offers a well-controlled method to produce these complex structures. Gratings with periodicities of 1-2 μm and depths of up to 3 μm are fabricated with dimensional tolerances of ±0.02 μm using laser interferometric techniques. Superposition is obtained by successive masking and etching operations. The optical transmission characteristics of these diffractive filters are analyzed and compared with rigorous diffraction theory.
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页码:3841 / 3848
页数:8
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