ELECTRON-OPTICAL CONDITIONS FOR THE FORMATION OF STRUCTURE IMAGES OF SILICON ORIENTED IN (110)

被引：3

作者：

NISHIDA, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 05期

关键词：

D O I：

10.1143/JJAP.19.799

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：799 / 806

页数：8

共 10 条

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