INTENSE LOW-ENERGY HEAVY-ION BEAMS FROM A TANDEM DYNAMITRON

被引:2
作者
BRAND, K
机构
来源
NUCLEAR INSTRUMENTS & METHODS | 1981年 / 184卷 / 01期
关键词
D O I
10.1016/0029-554X(81)90865-X
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A second injector has been installed in front of the established one to be used mainly for heavy ion beams. The high resolution 90 degree analyzing magnet (M/ DELTA M equals 100) is mounted on a rotary mount to allow for the simultaneous installation of different types of ion sources. Better ion optics of the new injector together with terminal cryopumping lead to improved transmission through the accelerator system.
引用
收藏
页码:187 / 194
页数:8
相关论文
共 3 条
[1]   IMPROVEMENT OF REFLECTED BEAM SPUTTER SOURCE [J].
BRAND, K .
NUCLEAR INSTRUMENTS & METHODS, 1978, 154 (03) :595-596
[2]  
GLASNER K, USING B LARSSONS OPT
[3]  
MIDDLETON R, UNPUBLISHED