NEW WAY FOR HIGH-RATE A-SI DEPOSITION

[1] BARDOS L, 1987, 6TH P INT C IPAT 87, P50

[2] BARDOS L, 1987, IN PRESS 14TH P CZEC

[3] HIGH-RATE DEPOSITION OF AMORPHOUS HYDROGENATED SILICON FROM A SIH4 PLASMA [J]. APPLIED PHYSICS LETTERS, 1984, 44 (06) : 600 - 602

[4] PLASMA-INDUCED AND PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION [J]. THIN SOLID FILMS, 1985, 130 (1-2) : 135 - 154

[1] BARDOS L, 1987, 6TH P INT C IPAT 87, P50

[2] BARDOS L, 1987, IN PRESS 14TH P CZEC

[3] HIGH-RATE DEPOSITION OF AMORPHOUS HYDROGENATED SILICON FROM A SIH4 PLASMA [J]. APPLIED PHYSICS LETTERS, 1984, 44 (06) : 600 - 602

[4] PLASMA-INDUCED AND PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION [J]. THIN SOLID FILMS, 1985, 130 (1-2) : 135 - 154