CHARACTERIZATION OF FOCUSED ION-BEAM MICROMACHINED FEATURES

被引：15

作者：

PELLERIN, JG

SHEDD, GM

GRIFFIS, DP

RUSSELL, PE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584463

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1810 / 1812

页数：3

共 8 条

[1]

BENNINGHOVEN A, 1987, SECONDARY ION MASS S, V86, P59

[2]

Cullity B. D., 1978, ELEMENTS XRAY DIFFRA, V2nd, P13

[3]

GOLDSTEIN J, 1981, SCANNING ELECTRON MI, P322

[4] MICROMACHINING OF OPTICAL STRUCTURES WITH FOCUSED ION-BEAMS [J].

HARRIOTT, LR ;

SCOTTI, RE ;

CUMMINGS, KD ;

AMBROSE, AF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :207-210

[5] SURFACE MICROMACHINING FOR MICROSENSORS AND MICROACTUATORS [J].

HOWE, RT .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :1809-1813

[6] THE FOCUSED ION-BEAM AS AN INTEGRATED-CIRCUIT RESTRUCTURING TOOL [J].

MELNGAILIS, J ;

MUSIL, CR ;

STEVENS, EH ;

UTLAUT, M ;

KELLOGG, EM ;

POST, RT ;

GEIS, MW ;

MOUNTAIN, RW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :176-180

[7] FOCUSED-ION-BEAM MICROMACHINED ALGAAS SEMICONDUCTOR-LASER MIRRORS [J].

PURETZ, J ;

DEFREEZ, RK ;

ELLIOTT, RA ;

ORLOFF, J .

ELECTRONICS LETTERS, 1986, 22 (13) :700-702

[8]

WARD BW, 1985, P SOC PHOTO-OPT INST, V537, P110, DOI 10.1117/12.947491

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